[Tianjin Jinzhong Ji HVAC purification equipment to recommend the star product - decontamination] clean room clean room temperature and humidity control temperature and humidity are mainly determined according to process requirements, but in the process to meet the conditions required refrigeration room project, should take into account the person's sense of comfort. With the improvement of air cleanliness requirements, the process appears to require more stringent temperature and humidity are also trend. After specific process temperature requirements also cited, but as a general principle, due to increasingly sophisticated precision, so the scope of the requirements for temperature fluctuations smaller. For example, in the production of large scale integrated circuit lithography exposure process ventilation ducts project, as the difference between the thermal expansion coefficient of the glass material mask and the wafer have become increasingly smaller. 100 um diameter wafers, the temperature rise of 1 degree, it caused a 0.24um linear expansion, so there must be a constant temperature ± 0.1 degrees, while the requirements of generally low humidity values, because people sweat later, the product will have pollution, especially semiconductor plant is afraid of sodium, this workshop temperature should not exceed 25 degrees, high humidity generated more questions. When the relative humidity exceeds 55%, the walls of the cooling water pipes, condensation project, when it occurs in a precision device or circuit can cause a variety of accidents. Relative humidity at 50% rust. In addition, the water molecules in the air through the dust silicon surface chemical adhesion adsorbed on the surface is difficult to remove when the humidity is too high. The higher the relative humidity, the more difficult to remove the adherent, when the relative humidity is below 30%, but also due to an electrostatic force so that the particles are easily adsorbed on the surface, while a large number of semiconductor devices prone to breakdown. For optimum humidity range of wafer production 35-45%. [Tianjin Jinzhong Ji HVAC purification equipment to recommend the star product - decontamination] pressure requirements for most clean space cooling plant project, in order to prevent the intrusion of outside contamination, the need to maintain the internal pressure (hydrostatic) higher than the outside pressure (HIP). Maintain the pressure difference should meet the following general principles: 1. Clean space pressure is higher than the pressure of non-clean space. 2. cleanliness level high pressure is higher than the adjacent room cleanliness level low pressure space. Rely on fresh air to maintain the pressure difference, the fresh air to be able to compensate for the pressure difference in the leakage air flow out from the gap. Therefore, the pressure difference between the physical meaning is the leakage (or permeation) resistance to a variety of air flow through the clean room when the gap. Refrigeration room works, Tianjin Jinzhong Ji decontamination company (certified), Tianjin project provided by the Tianjin Jinzhong Ji HVAC purification equipment. Tianjin Jinzhong Ji HVAC purification equipment Limited (www.Jzjnt.com) is a leader in Tianjin, fans, ventilation equipment, over the years, the company is implementing the scientific management, innovation and development, the principle of honesty and trustworthiness, and satisfy customer needs. In the group leadership with the staff warmly welcome all inquiries negotiations to create a better future for the base.